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      首頁>Product Center>Sputtering Target and Evaporation Material>Target for IC Fabricating

      Target for IC Fabricating

      4 to 12 Inches Target for IC Fabricating

      Material

      Purity

      Configurations

      Al & Al alloy

      5N, 5N5

      Varian TM , MRC TM , KDF TM,

      ANELVA TM , ULVAC TM

      Oerlikon (Balzer) TM ,

      AMAT TM , Novellus TM , etc

      Other configurations available acc. to customer’s specs.

      Cu

      5N, 6N

      Ti

      4N5, 5N

      Ta

      4N, 4N5

      Co

      5N

      NiV

      3N5

      NiCr

      3N5

      NiPt

      3N5

      Cr

      3N5, 4N

      Mo

      3N5

      WTi

      4N,4N5

      Ni

      4N, 4N5

      Ag

      4N, 5N

      Au

      4N, 5N

      Pt

      4N